Abstract

White reflective patterns are very difficult to fabricate, due to the scattering and reflection of light, especially when the pattern size goes down to micron size. A reflective white barrier structure of height <TEX>$50{\mu}m$</TEX> and width <TEX>$80{\mu}m$</TEX> was fabricated using dry-film resist as an intermediate reverse pattern. The reverse dry-film resist pattern was coated with an <TEX>$SiO_2$</TEX> layer by sputtering, to protect the resist from chemical attack by the radical molecules in UV white resin. The UV white resin was applied on the dry-film resist pattern and then cured with ultraviolet light. The fine three-dimensional reflective patterns were finished by removing the dry-film resist.

© 2015 Optical Society of Korea

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