Abstract

In this erratum we have replaced the wrong figures and corrected several misprints that were found in our recently published paper [J. Opt. Soc. Am. B 31, 1822 (2014) [CrossRef]  ].

© 2014 Optical Society of America

We have found that there were errors in the field plots that appeared in our recently published paper [1]. The electric-field distributions presented in Figs. 11(a)–11(c) had a scale bar with misleading geometrical dimensions, and the lateral slab regions of the slot waveguide (as denoted by black outline rectangles) were wrongly positioned. Figures 11(a)–11(c) in that paper should be replaced by Figs. 1(a)1(c) presented here.

 figure: Fig. 1.

Fig. 1. (a) Normalized Ex profile on base-10 logarithmic scale for the 0 nm/25 nm silver/silicon layer thickness ratio situation. (b) Normalized Ex profile on base-10 logarithmic scale for the 15 nm/10 nm silver/silicon layer thickness ratio situation. (c) Normalized Ex profile on base-10 logarithmic scale for the 25 nm/0 nm silver/silicon layer thickness ratio situation.

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Additionally, the reference numbers in the first two paragraphs of the Section 4 on page 1825 should be modified as follows:

  • (1) [37] should be replaced by [38];
  • (2) [38] should be replaced by [39];
  • (3) [39] should be replaced by [40].

REFERENCE

1. E. G. Mironov, L. Liu, H. T. Hattori, and R. M. De La Rue, “Analysis of silica-filled slot waveguides based on hyperbolic metamaterials,” J. Opt. Soc. Am. B 31, 1822–1828 (2014). [CrossRef]  

References

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  1. E. G. Mironov, L. Liu, H. T. Hattori, and R. M. De La Rue, “Analysis of silica-filled slot waveguides based on hyperbolic metamaterials,” J. Opt. Soc. Am. B 31, 1822–1828 (2014).
    [Crossref]

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Figures (1)

Fig. 1.
Fig. 1. (a) Normalized E x profile on base-10 logarithmic scale for the 0 nm/25 nm silver/silicon layer thickness ratio situation. (b) Normalized E x profile on base-10 logarithmic scale for the 15 nm/10 nm silver/silicon layer thickness ratio situation. (c) Normalized E x profile on base-10 logarithmic scale for the 25 nm/0 nm silver/silicon layer thickness ratio situation.

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