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Cold-plasma production for recombination extreme-ultraviolet lasers by optical-field-induced ionization

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Abstract

For high-intensity, linearly polarized light, above-threshold ionization results from the time difference between the instant of ionization and the electric field maximum. Cold plasmas suitable for recombination extreme-ultraviolet (XUV) lasers can be produced if appropriate wavelength-ionizing radiation is used. Multiphoton ionization intensities are calculated for representative XUV laser schemes.

© 1989 Optical Society of America

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