Polarization- and angle-insensitive ultrabroadband perfect metamaterial absorber for thermophotovoltaics

Ashish Kumar Chowdhary; Tanmay Bhowmik; Debabrata Sikdar

doi:10.1364/JOSAB.411643

Journal of the Optical Society of America B
Vol. 38,
Issue 2,
pp. 327-335
(2021)
•https://doi.org/10.1364/JOSAB.411643

Polarization- and angle-insensitive ultrabroadband perfect metamaterial absorber for thermophotovoltaics

Ashish Kumar Chowdhary, Tanmay Bhowmik, and Debabrata Sikdar

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Ashish Kumar Chowdhary, Tanmay Bhowmik, and Debabrata Sikdar, "Polarization- and angle-insensitive ultrabroadband perfect metamaterial absorber for thermophotovoltaics," J. Opt. Soc. Am. B 38, 327-335 (2021)

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Table of Contents Category
- Metamaterials
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About this Article
History
- Original Manuscript: October 2, 2020
- Revised Manuscript: November 24, 2020
- Manuscript Accepted: December 7, 2020
- Published: January 4, 2021

Abstract

We report an ultrabroadband perfect metamaterial absorber, comprising a two-dimensional array of a hemi-ellipsoid shaped metallo-dielectric multilayered structure. What we believe, to the best of our knowledge, is an unprecedented average absorbance of ${\sim}99\%$ is theoretically demonstrated in the 300 to 4500 nm spectral range at normal incidence. We use 20 pairs of molybdenum–germanium metallo-dielectric layers with tungsten as the ground metal placed on a silicon substrate. Our design is polarization-independent as well as angle-insensitive (up to 60°), making it a perfect “superabsorber.” Theoretical modeling based on effective medium theory validates our full-wave simulation results. The figure-of-merit calculations suggest that our superabsorber can outperform recently reported broadband absorbers. The proposed design has potential application in thermophotovoltaics for solar energy harvesting.

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Fabrication Tolerance	Metal Thickness ( $t_{M 1}$ )	Dielectric Thickness ( $t_{D}$ )	Length of Each Minor Axis ( $d$ )
Upper limit	100	47	430
Lower limit	60	35	370
Optimum dimension	78	42	400

References	Structural Design	Range (nm)	Avg. A (%)	P.I.	A.I. (up to)	$η$
Liu et al. [43]	(Ti/V/W)– ${S i O}_{2}$ –(Ti/V/W)	280–4000	91	Yes	NA	NA
Hoa et al. [44]	Au–Si–Au	400–1600	$\sim 90$	Yes	Yes (60°)	0.9
Soydan et al. [45]	TMC/TMN– ${A l}_{2} O_{3}$ (multilayer)	300–2500	90	No	Yes (60°)	0.8
Aalizadeh et al. [46]	Ti–Mn– ${A l}_{2} O_{3}$ –Ti	480–3280	90	Yes	Yes (40°)	0.9
Lin et al. [47]	Graphene– ${S i O}_{2}$ (multilayer)–Ag	300–2500	85	Yes	Yes (60°)	0.7
Gao et al. [48]	${SiO}_{2}$ –TiN– ${S i O}_{2}$ –TiN	200–1200	90	Yes	Yes (40°)	0.9
This work	Mo–Ge (20 pairs)–W	300–4500	$\sim 99$	Yes	Yes (60°)	0.8

Fabrication Tolerance	Metal Thickness ( $t_{M 1}$ )	Dielectric Thickness ( $t_{D}$ )	Length of Each Minor Axis ( $d$ )
Upper limit	100	47	430
Lower limit	60	35	370
Optimum dimension	78	42	400

References	Structural Design	Range (nm)	Avg. A (%)	P.I.	A.I. (up to)	$η$
Liu et al. [43]	(Ti/V/W)– ${S i O}_{2}$ –(Ti/V/W)	280–4000	91	Yes	NA	NA
Hoa et al. [44]	Au–Si–Au	400–1600	$\sim 90$	Yes	Yes (60°)	0.9
Soydan et al. [45]	TMC/TMN– ${A l}_{2} O_{3}$ (multilayer)	300–2500	90	No	Yes (60°)	0.8
Aalizadeh et al. [46]	Ti–Mn– ${A l}_{2} O_{3}$ –Ti	480–3280	90	Yes	Yes (40°)	0.9
Lin et al. [47]	Graphene– ${S i O}_{2}$ (multilayer)–Ag	300–2500	85	Yes	Yes (60°)	0.7
Gao et al. [48]	${SiO}_{2}$ –TiN– ${S i O}_{2}$ –TiN	200–1200	90	Yes	Yes (40°)	0.9
This work	Mo–Ge (20 pairs)–W	300–4500	$\sim 99$	Yes	Yes (60°)	0.8

Ashish Kumar Chowdhary	https://orcid.org/0000-0002-2019-360X
Tanmay Bhowmik	https://orcid.org/0000-0002-4719-440X
Debabrata Sikdar	https://orcid.org/0000-0003-3399-9407

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Journal of the Optical Society of America B