Abstract

In this study, the double-pulse Bessel beam ablation of fused silica glass is investigated. Compared to a conventional Bessel–Gauss beam, a double-pulse Bessel–Gauss beam can greatly enhance the photo-modification zone. As the time delay increases, the photo-modification zone first increases and then decreases. By optimizing the processing parameter, the photo-modification zone with a diameter in the range of 1.5–3 µm and an aspect ratio of about 1500:1 can be fabricated. Compared to the zone processed by a single-pulse Bessel–Gauss beam, the photo-modification zone of a double-pulse Bessel–Gauss beam increases by a factor of 500. Furthermore, the processing parameter of the pulse energy distribution ratio is also investigated to optimize fabrication. In addition, the experimental results show that the obtained etching rate of the photo-modification zone processed by the double-pulse Bessel–Gauss beam with a time delay of 50 ps is four times that of the single-pulse Bessel–Gauss beam. As an application example, a microreaction cell is fabricated using a femtosecond laser, double-pulse Bessel–Gauss beam to demonstrate the advantage of the proposed method in fabricating three-dimensional microfunctional structures.

© 2020 Optical Society of America

Femtosecond laser double pulse Bessel beam ablation of silicon

Dongkai Chu, Weizhen Li, Shuoshuo Qu, Xinran Dong, and Peng Yao
Appl. Opt. 60(35) 10802-10806 (2021)

Fused silica ablation by double femtosecond laser pulses: influence of polarization state

Kevin Gaudfrin, John Lopez, Konstantin Mishchik, Laura Gemini, Rainer Kling, and Guillaume Duchateau
Opt. Express 28(10) 15189-15206 (2020)

Enhancement of femtosecond laser-induced surface ablation via temporal overlapping double-pulse irradiation

Zhenyuan Lin, Lingfei Ji, and Minghui Hong
Photon. Res. 8(3) 271-278 (2020)

Polarization effect during propagation of a femtosecond laser pulse in fused silica glass

Jing Yu, Hongbing Jiang, Hong Yang, and Qihuang Gong
J. Opt. Soc. Am. B 29(8) 1937-1941 (2012)

Fused silica ablation by double ultrashort laser pulses with dual wavelength and variable delays

K. Gaudfrin, J. Lopez, L. Gemini, M. Delaigue, C. Hönninger, R. Kling, and G. Duchateau
Opt. Express 30(22) 40120-40135 (2022)