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Fabrication tolerance of asymmetric silicon-on-insulator polarization rotators

Henghua Deng, David O. Yevick, Chris Brooks, and Paul E. Jessop

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Abstract

We investigate the fabrication tolerance of novel slanted-angle silicon-on-insulator polarization rotators with asymmetric external waveguiding regions. We also minimize the input and output coupling loss between the polarization rotator and the rib waveguides through a lateral shift in the relative waveguide positions.

© 2006 Optical Society of America

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