Abstract

During kinetic ellipsometric investigations in light-intensive plasma discharges, an offset error generally must be taken into consideration. The influence of an offset error on the ellipsometric angles Ψ and Δ is demonstrated, and possibilities for overcoming this problem are presented. Examples are given for deposition of titanium by a hollow cathode arc evaporation device and by a dc magnetron sputter source. Ellipsometric measurements were done with two ellipsometers: a monochromatic ellipsometer with a rotating analyzer and an ellipsometer with a photoelastic modulator.

© 1997 Optical Society of America

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