Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Increasing the Far-Ultraviolet Reflectance of Silicon-Oxide-Protected Aluminum Mirrors by Ultraviolet Irradiation

Not Accessible

Your library or personal account may give you access

Abstract

The effect of ultraviolet irradiation on the visible and ultraviolet reflectance of silicon-oxide-protected aluminum mirrors was studied. The silicon oxide protective films were produced by evaporating silicon monoxide under various evaporation conditions. High deposition rates at low pressure result in films of true SiO which are absorbing in the ultraviolet and shorter wavelength region of the visible, and which are, therefore, unsuitable for protecting mirrors that are to be used in this spectral region. Films deposited at low rates and rather high pressures of oxygen (deposition rate <5 Å/sec at 8–10×10−5 Torr) consist predominantly of Si2O3, and exhibit strong absorptance only below λ=3000 Å. Their ultraviolet absorptance can be completely eliminated by ultraviolet irradiation from a quartz mercury burner. This makes it possible to produce well-protected aluminum mirrors with 92% reflectance down to λ=2200 Å. Infrared measurements have shown that the elimination of the ultraviolet absorptance of Si2O3 films by ultraviolet treatment is not caused by a conversion of Si2O3 into SiO2. The reflectance of aluminum coated with true SiO is not affected by ultraviolet irradiation. Data on the solar absorptance of silicon-oxide-protected aluminum mirrors are presented.

© 1963 Optical Society of America

Full Article  |  PDF Article
More Like This
Effect of Ultraviolet Irradiation on the Optical Properties of Silicon Oxide Films

A. P. Bradford, G. Hass, M. McFarland, and E. Ritter
Appl. Opt. 4(8) 971-976 (1965)

On the Vacuum-Ultraviolet Reflectance of Evaporated Aluminum before and during Oxidation*

R. P. Madden, L. R. Canfield, and G. Hass
J. Opt. Soc. Am. 53(5) 620-625 (1963)

Optical Properties of Silicon Monoxide in the Wavelength Region from 0.24 to 14.0 Microns*

Georg Hass and Calvin D. Salzberg
J. Opt. Soc. Am. 44(3) 181-187 (1954)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (8)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Tables (1)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.