Abstract

A unit magnification system is described which is free from Seidel aberrations and which can be used at very high aperture. The leading higher order aberrations are derived.

A method using this system for reproducing photographically small groups of lines with a spacing of 6000 lines/in. is described.

Several other possible applications of the system are outlined.

© 1959 Optical Society of America

Projective Formulation of the Problems of Geometrical Optics. I. Theoretical Foundations

Enzo Cambi
J. Opt. Soc. Am. 49(1) 2-15 (1959)

Unit magnification optical system

Seymour Rosin
Appl. Opt. 16(9) 2568-2571 (1977)

Mirror Anastigmat with Two Concentric Spherical Surfaces

Paul Erdös
J. Opt. Soc. Am. 49(9) 877-886 (1959)

Optical Aberration Coefficients. V. On the Quality of Predicted Displacements

H. A. Buchdahl
J. Opt. Soc. Am. 49(11) 1113-1114 (1959)

Concerning the Nature of the Aberrations in Electron Sheet Beams

William E. Waters
J. Opt. Soc. Am. 49(3) 304-307 (1959)