Abstract
We present a novel method to fabricate planar photonic devices for high power applications using modified chemical vapor deposition (MCVD) technology. The MCVD process, usually applied to optic fibers, is used here to deposit a layer of Ge doped silica on a fused silica slab. The doped layer was then heat-treated by a CO2 laser in order to achieve high optical quality and increase its damage threshold. Finally, direct laser lithography, followed by deep dry etching, was used to shape straight and curved large-core air-cladded waveguides with smooth sidewalls. The straight waveguides were shown to have an excellent propagation loss, 0.33 dB/cm, and the curved waveguide had a propagation loss of 1 dB/cm.
PDF Article
More Like This
Cited By
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription