Abstract
Micro-optical devices embedded in transparent materials are usually
manufactured focusing a pulsed laser in bulk fused silica. Under this condition,
pulsewidth becomes the most important parameter that rules the size of the
inscriptions. Ultrafast pulses (pico- and femtosecond pulses) avoid thermal
effects and the results present a high efficiency. Nevertheless, nanosecond
lasers are more available due the reduced costs. Therefore, a study of the
optical behavior of embedded elements micromachined by nanosecond pulses is
required. In this study, we show that this regime of pulses can still be used
for engraving diffractive optical elements in transparent materials, regardless
of the thermal damage. A Fresnel zone plate and a far-field beam shaper have
been manufactured as an example of the functionality of these devices.
© 2011 IEEE
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