Abstract
We use star couplers to measure the relative scattering losses of silicon-on-insulator
(SOI) ridge waveguides of various widths over the range of 1.75 to 0.2 $\mu$m in a single
measurement. The scattering loss data obtained for waveguides fabricated by
different photolithography and e-beam base processes correlate well with the
measured root-mean-square roughness of the waveguide sidewalls obtained using
SEM image analysis, and are in qualitative agreement with the prediction of
simple scattering loss theory.
© 2009 IEEE
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