Abstract

We demonstrate integrated optical mirrors in alumina-based waveguides on oxidized silicon substrates. The finite-element method (FEM) is employed for the design of mirrors operating between 1.31 and 1.55 µm at both fundamental polarizations. Excellent agreement between measurement and simulation is achieved for the dispersion behavior of the device. The highly polarization-dependent scattering loss at the reflecting interface is well predicted considering approximate values for the reactive ion etching (RIE) process induced surface roughness.

© 2003 IEEE

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