Hybrid glass materials are used in the photolithographic fabrication of optical and optomechanical structures. Two different photolithographic hybrid glass processing methods are described. The first one is referred as photolithographic patterning and the second as direct photolithographic deforming of hybrid glass materials. No etch transfer of the photoimaged structures is needed. In the latter method even the chemical development step can be excluded from the fabrication. Fabrication of lens-arrays, gratings and other binary structures is presented. The synthesized hybrid glass materials feature minimum optical transmission of 97% at wavelengths ranging from 450 nm to 1600 nm and refractive index of, e.g., 1.53 at 632.8 nm. The photolithographic patterning resulted in structure heights in excess of 180 µm with rms surface roughness values ranging from 10 to 45 nm. The direct photolithographic deforming resulted in structure heights in excess of 27 µm with rms surface roughness values ranging from 1 and 15 nm.
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
Login to access OSA Member Subscription