Abstract

A three-dimensional (3-D) microoptical bench prepared using bulk micromachining is constructed demonstrating a compact optical setup. Prealigned microstructures with space for mounting bulk elements are prepared. A 3-D photolithographic technique is applied with good repeatability using an originally developed resist spray-coating system. Films grown by low-pressure chemical-vapor deposition (LPCVD) are used as construction layers combining with 3-D bulk structures. A skew micromirror at the free end of a thermally actuated cantilever is fabricated facing to a laser diode chip. An optical-scan angle of more than 30° and a cutoff frequency of 100 Hz are obtained.

[IEEE ]

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