Abstract
Near-field properties of light emanated from a subwavelength double slit of
finite length in a thin metal film, which is essential for understanding fundamental
physical mechanisms for near-field optical beam manipulations and various potential
nanophotonic device applications, is investigated by using a three-dimensional
finite-difference time-domain method. Near-field intensity distribution along the
propagation direction of light after passing through the slit has been obtained from
the phase relation of transverse electric and magnetic fields and the wave
impedance. It is found that the near field of emerged light from the both slits is
evanescent, that is consistent with conventional surface plasmon localization near
the metal surface. Due to the finite of the slit, the amplitude of this evanescent
field does not monotonically approach to than of the infinite slit as the slit
length increases, i.e. the near-field of the longer slit along the center line can
be weaker than that of the shorter one.
© 2011 Optical Society of Korea
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