Abstract

In three-dimensional confocal microscopy, two-dimensional width measurement can be significantly influenced by the groove height. The groove height not only results in deformation of the input light field due to the effect of edge occlusions, but also introduces a defocus error to the detection plane. This paper proposes a new, to the best of our knowledge, edge-setting method to determine groove width, which engineers the point spread function to correct for the groove edge obstruction effect and develops an edge obstruction imaging model (EOIM) based on the variable point spread function. This model gives a relationship between the groove height and the normalized intensity at the groove edge and can use this relationship to determine the groove edge position that would result from focusing at the groove’s lower surface. Experimental results show that an EOIM-based width determination method is more accurate than the traditional 1/4 edge-setting method. Compared to the 1/4 edge-setting method, the deviation from a reference width measured with traceable scanning electron microscopy is reduced by a factor of 2.1 with a 1.3 times smaller standard deviation.

© 2020 Optical Society of America

Image based aberration retrieval using helical point spread functions

René Berlich and Sjoerd Stallinga
Appl. Opt. 59(22) 6557-6572 (2020)

Determination of point-spread function of paper substrate based on light-scattering simulation

D. Modrić, K. Petric Maretić, and Aleš Hladnik
Appl. Opt. 53(33) 7854-7862 (2014)

Space-variant point spread function measurement and interpolation at any depth based on single-pixel imaging

Hongzhi Jiang, Yu Wang, Xudong Li, Huijie Zhao, and Yuxi Li
Opt. Express 28(7) 9244-9258 (2020)

Point spread function degradation model of a polarization imaging system for wide-field subwavelength nanoparticles

Wu Qiong, Kun Gan, Zizheng Hua, Zhenzhou Zhang, Hanwen Zhao, Jichuan Xiong, and Peilin Yu
Appl. Opt. 59(23) 7114-7124 (2020)

Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresist

Patrick P. Naulleau
Appl. Opt. 43(4) 788-792 (2004)