Abstract

A technique is described for recording holograms and forming diffraction gratings in Shipley AZ1350 photoresist using the 4579-Å output from an argon laser. A pre-exposure technique is described that not only reduces exposure times but increases the signal-to-noise ratio of the image. It is also shown that the effects of the variable characteristic of the resist can be alleviated by monitoring diffraction efficiency during development.

© 1970 Optical Society of America

Characteristics of Relief Phase Holograms Recorded in Photoresists

R. A. Bartolini
Appl. Opt. 13(1) 129-139 (1974)

Development in situ for gratings recorded in photoresist

Juan Antonio Rayas, Amalia Martínez, Ramón Rodríguez-Vera, and Sergio Calixto
Appl. Opt. 42(34) 6877-6879 (2003)

Characteristics of a Photoresist Hologram and Its Replica

Fujio Iwata and Jumpei Tsujiuchi
Appl. Opt. 13(6) 1327-1336 (1974)

Heat-Processed Photoresist for Holographic Data Storage Applications

R. G. Zech, J. C. Dwyer, H. Fichter, and M. Lewis
Appl. Opt. 12(12) 2822-2827 (1973)

Thick Absorption Recording Media in Holography

A. A. Friesem and J. L Walker
Appl. Opt. 9(1) 201-214 (1970)