Abstract

In the exposure of microcircuits, it is attractive to replace contact printing with projection printing to avoid direct contact between the silicon wafer and glass master. Since etched photoresists do not exhibit a gray scale, the conventional criteria of projection printing do not apply. In order to establish adequate criteria for projection printing onto photoresists, the imaging properties of diffraction-limited optics and the recording characteristics of photoresists are examined. A criterion based on edge uncertainty of lines is proposed. Other aspects of projection systems are briefly considered.

© 1969 Optical Society of America

Fourier Analysis and Nonlinear Optical Systems

Adolph Baker and David Korff
Appl. Opt. 8(3) 563-568 (1969)

Theoretical modeling of the simultaneous exposure and development (SED) process of a positive photoresist

W. T. Tsang
Appl. Opt. 16(7) 1918-1930 (1977)

Absorption and exposure in positive photoresist

Chris A. Mack
Appl. Opt. 27(23) 4913-4919 (1988)

A Comparison of Two Different Methods of OTF Measurement

E. C. Yeadon
Appl. Opt. 8(12) 2541-2544 (1969)

Dyed Photographic Emulsions for Improved Recording of Projected Images

R. E. Kerwin
Appl. Opt. 8(9) 1891-1895 (1969)