Optical interference coating design contest 2019: a non-polarizing beam splitter and a color-mixing challenge [Invited]

Jennifer D. T. Kruschwitz; Vladimir Pervak; Jason Keck; Eric Baltz; Amit Deliwala; Zachary Gerig; Fabien Lemarchand; Samuel Pellicori; Kageyuki Sato; William Southwell; Michael Trubetskov; Kunihiko Yano; Wenjia Yuan

doi:10.1364/AO.378119

Applied Optics
Vol. 59,
Issue 5,
pp. A206-A212
(2020)
•https://doi.org/10.1364/AO.378119

Optical interference coating design contest 2019: a non-polarizing beam splitter and a color-mixing challenge [Invited]

Jennifer D. T. Kruschwitz, Vladimir Pervak, Jason Keck, Eric Baltz, Amit Deliwala, Zachary Gerig, Fabien Lemarchand, Samuel Pellicori, Kageyuki Sato, William Southwell, Michael Trubetskov, Kunihiko Yano, and Wenjia Yuan

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Jennifer D. T. Kruschwitz, Vladimir Pervak, Jason Keck, Eric Baltz, Amit Deliwala, Zachary Gerig, Fabien Lemarchand, Samuel Pellicori, Kageyuki Sato, William Southwell, Michael Trubetskov, Kunihiko Yano, and Wenjia Yuan, "Optical interference coating design contest 2019: a non-polarizing beam splitter and a color-mixing challenge [Invited]," Appl. Opt. 59, A206-A212 (2020)

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Abstract

A non-polarizing beam splitter and a light color-mixing challenge were the topics of the design contest held in conjunction with the 2019 Optical Interference Coatings topical meeting of the Optical Society of America. A total of 10 designers from China, France, Germany, Japan, and the United States submitted over 70 designs for problems A and B. The design problems and the submitted solutions are described and evaluated.

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Designer	Institution	A B.1 B.2
Eric Baltz	Research EO Optics, USA	✓ ✓ ✓
Amit Deliwala	Light Matters LLC, USA	✓ — —
Zachary Gerig	FiveNine Optics, USA	✓ — —
Fabien Lemarchand	Institut Fresnel, FRANCE	✓ — —
Samuel Pellicori	Pellicori Optical Consulting, USA	✓ — ✓
Kageyuki Sato	Optical Coatings Japan, JAPAN	✓ — —
William Southwell	Table Mountain Optics, USA	✓ ✓ ✓
Michael Trubetskov	Max Planck Inst. of Quantum Optics, GERMANY	✓ ✓ ✓
Kunihiko Yano	Seiko Epson Corporation, JAPAN	— ✓ ✓
Wenjia Yuan	Zhejiang University, CHINA	✓ ✓ —

Dielectric Layer Materials	Medium/Substrate
( $S y m b o l = n$ )
$F = 1.38$ $D = 2.05$	$n_{m e d i u m} = 1.0$
$L = 1.45$ $T = 2.2$	$n_{s u b s t r a t e} = 1.52$
$E = 1.65$ $H = 2.35$
$M = 1.8$

Designers	Three Materials
Trubetskov1, Trubetskov3, Baltz, Lemarchand, Yuan1, Yuan2, Pellicori2	F, E, H
Trubetskov2, Southwell, Sato Deliwala, Pellicori1	F, M, H
Gerig	E, M, H

Designer	Place	BW, nm	Thk, µm	No. of Layers
Trubetskov1	1	63.93	21.63	373
Baltz	2	63.71	14.81	342
Lemarchand	3	63.32	20.63	278
Trubetskov3 ^a	1	10.26	17.32	92
Pellicori2 ^a	2	4.74	2.53	28

Designer	OIC 2007	OIC 2019	Improvement
1. Trubetskov	58.686	63.932	8.94%
2. Lemarchand	61.706	63.320	2.62%
3. Southwell	41.500	62.101	49.64%
4. Trubetskov ^a	2.0	10.26	413.00%
Top Designs 2007/2019	61.706	63.932	3.60%

Dielectric Layer Materials	Metal Layers/Medium/Sub
( $S y m b o l = n$ )	( $S y m b o l = n, k$ )
$F = 1.38$ $D = 2.05$	$A g = 0.12$ , 3.45
$L = 1.45$ $T = 2.2$	$A u = 0.306$ , 2.88
$E = 1.65$ $H = 2.35$	$N i = 1.8$ , 3.33
$M = 1.8$	$n_{m e d i u m} = 1.0$
	$n_{s u b s t r a t e} = 1.52$

Problem	Designer	MF	Place	Output	Phase
B.1	Trubetskov	0.06786	1	0.02081	0.04705
B.1	Yano	0.07009	2	0.01839	0.05170
B.1	Southwell	0.10122	3	0.03609	0.06512
B.2	Trubetskov	0.00897	1	0.00533	0.00363
B.2	Yano	0.00976	2	0.00590	0.00386
B.2	Southwell	0.02894	3	0.02102	0.00792

Jennifer D. T. Kruschwitz	https://orcid.org/0000-0003-3047-5253
Michael Trubetskov	https://orcid.org/0000-0003-1490-0264

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Applied Optics