Development and growth of corrosion features on protected silver mirrors during accelerated environmental exposure

Kelsey A. Folgner; Chung-Tse Chu; Scott D. Sitzman; Sean C. Stuart; Zachary R. Lingley; James D. Barrie

doi:10.1364/AO.375891

Applied Optics
Vol. 59,
Issue 5,
pp. A187-A197
(2020)
•https://doi.org/10.1364/AO.375891

Development and growth of corrosion features on protected silver mirrors during accelerated environmental exposure

Kelsey A. Folgner, Chung-Tse Chu, Scott D. Sitzman, Sean C. Stuart, Zachary R. Lingley, and James D. Barrie

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Kelsey A. Folgner, Chung-Tse Chu, Scott D. Sitzman, Sean C. Stuart, Zachary R. Lingley, and James D. Barrie, "Development and growth of corrosion features on protected silver mirrors during accelerated environmental exposure," Appl. Opt. 59, A187-A197 (2020)

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About this Article
History
- Original Manuscript: September 17, 2019
- Revised Manuscript: November 14, 2019
- Manuscript Accepted: December 16, 2019
- Published: January 29, 2020

Abstract

Various layer schemes have been developed to protect thin film silver mirrors from tarnish and corrosion. However, the mechanisms by which these additional layers improve mirror durability are not fully understood. Accelerated environmental exposure testing of protected silver mirrors was used to investigate the effects of layer composition on the mechanisms of corrosion feature development and growth. Two model mirror coatings were analyzed in which the composition of the base layer below the silver and the adhesion layer above the silver were varied. Large circular corrosion features formed preferentially along the silver–chromium interfaces, regardless of where this interface was located within the layered structure of the mirror. The corrosion features originated at coating defects in the dielectric protection layer, and their growth was likely driven by the oxidation and chloridation of both silver and chromium at the Ag–Cr interfaces.

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Material	Layer Type	Nominal Thickness (Å)	Rate (Å/min)	Target	RF Power (W)	Target Bias Power (W)
NiCr	Base Layer (1)	200	72	Nichrome	1000	1000
Cr	Base Layer (1)	200	60	Chromium	1000	1000
Ag	Reflective Layer (2)	1200	174	Silver	1000	1000
${C r N}_{x}$	Adhesion Layer (3)	5	48	Chromium	1000	1000
${N i C r N}_{x}$	Adhesion Layer (3)	5	78	Nichrome	1000	1000
${S i N}_{x}$	Protective Layer (4)	100	24	Silicon	1300	1000

Compound	$Δ G_{f}^{0}$ ( $k J / m o l$ )
AgCl	−110
${N i C l}_{2}$	−259
${C r C l}_{2}$	−356
${C r C l}_{3}$	−486
${A g}_{2} O$	−11.2
NiO	−212
${N i}_{2} O_{3}$	—
${C r}_{2} O_{3}$	−1058
${A g}_{2} S$	−41.7
NiS	−79.5
${N i}_{3} S_{2}$	−197
${C r}_{2} S_{3}$	—

Material	Layer Type	Nominal Thickness (Å)	Rate (Å/min)	Target	RF Power (W)	Target Bias Power (W)
NiCr	Base Layer (1)	200	72	Nichrome	1000	1000
Cr	Base Layer (1)	200	60	Chromium	1000	1000
Ag	Reflective Layer (2)	1200	174	Silver	1000	1000
${C r N}_{x}$	Adhesion Layer (3)	5	48	Chromium	1000	1000
${N i C r N}_{x}$	Adhesion Layer (3)	5	78	Nichrome	1000	1000
${S i N}_{x}$	Protective Layer (4)	100	24	Silicon	1300	1000

Compound	$Δ G_{f}^{0}$ ( $k J / m o l$ )
AgCl	−110
${N i C l}_{2}$	−259
${C r C l}_{2}$	−356
${C r C l}_{3}$	−486
${A g}_{2} O$	−11.2
NiO	−212
${N i}_{2} O_{3}$	—
${C r}_{2} O_{3}$	−1058
${A g}_{2} S$	−41.7
NiS	−79.5
${N i}_{3} S_{2}$	−197
${C r}_{2} S_{3}$	—

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Applied Optics