Abstract
Rotational spatial plasma-enhanced atomic layer deposition has been used to deposit thin films on half-sphere lenses. Non-uniformity of less than $ \pm 1\% $ is demonstrated for $ {{\rm Nb}_2}{{\rm O}_5} $ deposited at 1.4 Å/s and for $ {{\rm SiO}_2} $ deposited at 6 Å/s.
© 2019 Optical Society of America
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