Abstract

Amorphous tantala (${{\rm Ta}_2}{{\rm O}_5}$) thin films were deposited by reactive ion beam sputtering with simultaneous low energy assist ${{\rm Ar}^ + }$ or ${{\rm Ar}^ + }/{\rm O}_2^ + $ bombardment. Under the conditions of the experiment, the as-deposited thin films are amorphous and stoichiometric. The refractive index and optical band gap of thin films remain unchanged by ion bombardment. Around 20% improvement in room temperature mechanical loss and 60% decrease in absorption loss are found in samples bombarded with 100-eV ${{\rm Ar}^ + }$. A detrimental influence from low energy ${\rm O}_2^ + $ bombardment on absorption loss and mechanical loss is observed. Low energy ${{\rm Ar}^ + }$ bombardment removes excess oxygen point defects, while ${\rm O}_2^ + $ bombardment introduces defects into the tantala films.

© 2020 Optical Society of America

Ultra-low stress SiO₂ coatings by ion beam sputtering deposition

Aaron Davenport, Emmett Randel, and Carmen S. Menoni
Appl. Opt. 59(7) 1871-1875 (2020)

Effects of bombardment on optical properties during the deposition of silicon nitride by reactive ion-beam sputtering

M. F. Lambrinos, R. Valizadeh, and J. S. Colligon
Appl. Opt. 35(19) 3620-3626 (1996)

Study on the surface modification of Ta₂O₅ bombarded by argon ions

Tan Shu, Yun Cui, Chunxian Tao, Dianfu Feng, Yuanan Zhao, and Jianda Shao
Opt. Mater. Express 12(12) 4547-4555 (2022)

Ion-assisted deposition of optical thin films: low energy vs high energy bombardment

John R. McNeil, Alan C. Barron, S. R. Wilson, and W. C. Herrmann
Appl. Opt. 23(4) 552-559 (1984)

Mechanical and thermoelastic characteristics of optical thin films deposited by dual ion beam sputtering

Eda Çetinörgü, Bill Baloukas, Oleg Zabeida, Jolanta E. Klemberg-Sapieha, and Ludvik Martinu
Appl. Opt. 48(23) 4536-4544 (2009)