Abstract
With the development of optical systems used in astronomical and earth observation, aspherical and free-form surfaces are increasingly used because they are lightweight and have improved image quality. As a highly accurate, aberrationless technique, computer-generated hologram (CGH) plays an important role in wavefront testing. At present, the main way to fabricate phase CGH is reactive ion etching, which suffers from low accuracy. To improve the accuracy, physical vapor deposition (PVD) is applied in the fabrication of phase CGH. The wavefront errors of PVD-fabricated phase CGH were analyzed. Testing results indicate that the wavefront error of the CGH is root mean square (RMS), mainly caused by the machine tool orthogonality error rather than the PVD process. The diffraction efficiency of the st order is 22.4%.
© 2018 Optical Society of America
Full Article | PDF ArticleMore Like This
Hongda Wei, Zhiyu Zhang, Qiang Cheng, Wa Tang, Mingzhuo Li, Haixiang Hu, Weijie Deng, and Xuejun Zhang
Opt. Express 32(1) 825-834 (2024)
Ping Zhou and James H. Burge
Appl. Opt. 46(5) 657-663 (2007)
Zi-Hao Gan, Xiao-Qiang Peng, Shan-Yong Chen, Chao-Liang Guan, Hao Hu, Xin-Lei Li, and Zuo-Cai Dai
Appl. Opt. 57(34) 9913-9921 (2018)