Abstract
In this paper, the scribing of the metal thin film using a continuous-wave laser is investigated theoretically and experimentally. We propose a reversible relation between incident fluence and ablation width. Microscopic analysis of the results is compared to theoretical expectations. Scribing has been done by focusing a 450 nm laser diode beam on 100 nm chromium thin film. Beam power and scanning speed are varied in the domains of 0.02–1.0 W and 0.05–5 mm/s, respectively. The microscopic images of the thin film show that the average ablation width on metal thin film varies slightly by increasing the scanning speed, which was anticipated by theory. Moreover if scanning speed increases, the ablation quality is reduced significantly and is not compensated by increasing incident power. According to microscopic images of the sample, this method could be a good substitute for pulsed-laser scribing in many applications such as making solar cells.
© 2018 Optical Society of America
Full Article | PDF ArticleMore Like This
Pinaki Das Gupta and Gerard M. O’Connor
Appl. Opt. 55(9) 2117-2125 (2016)
Yonggang Shen, Yong Gan, Wanjun Qi, Yaogen Shen, and Zhen Chen
Appl. Opt. 54(7) 1737-1742 (2015)
Sae Chae Jeoung, Heung-Soon Lee, Ji Sang Yahng, Hyun Kyu Lee, Heh Young Moon, Kyoun Joon Kim, Dong Geun Lee, Duck Hoon Park, Young Sam Yu, and Suk- Jae Ji
Opt. Express 19(18) 16730-16738 (2011)