Determination of optical constants including surface characteristics of optically thick nanostructured Ti films: analyzed by spectroscopic ellipsometry

Jyoti Jaiswal; Satyendra Mourya; Gaurav Malik; Samta Chauhan; Amit Sanger; Ritu Daipuriya; Manpreet Singh; Ramesh Chandra

doi:10.1364/AO.55.008368

Applied Optics
Vol. 55,
Issue 29,
pp. 8368-8375
(2016)
•https://doi.org/10.1364/AO.55.008368

Determination of optical constants including surface characteristics of optically thick nanostructured Ti films: analyzed by spectroscopic ellipsometry

Jyoti Jaiswal, Satyendra Mourya, Gaurav Malik, Samta Chauhan, Amit Sanger, Ritu Daipuriya, Manpreet Singh, and Ramesh Chandra

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Jyoti Jaiswal, Satyendra Mourya, Gaurav Malik, Samta Chauhan, Amit Sanger, Ritu Daipuriya, Manpreet Singh, and Ramesh Chandra, "Determination of optical constants including surface characteristics of optically thick nanostructured Ti films: analyzed by spectroscopic ellipsometry," Appl. Opt. 55, 8368-8375 (2016)

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Abstract

In the present work, optically thick nanostructured titanium (Ti) films of thickness ranging from $\sim 100$ to 900 nm were deposited on a glass substrate by DC magnetron sputtering at room temperature. Microstructural and surface properties of the samples were studied by x-ray diffraction and x-ray photoelectron spectroscopy (XPS). The morphological results revealed a systematic normal grain growth mechanism with increasing thickness analyzed by a scanning electron microscope. The influence of thickness on film surface roughness has been investigated by atomic force microscopy (AFM). The optical dispersion behavior was examined by spectroscopic ellipsometry (SE) over the long wavelength range of 246–1688 nm. The experimentally observed SE parameters were theoretically fitted with Drude–Lorentz and Bruggeman effective medium approximation theory. The surface properties of the Ti film measured by XPS and AFM were further accounted for in the optical model to determine optical constants ( $n$ and $k$ ) and the obtained results are expected to be the best available for bulk Ti metal.

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Supplementary Material (4)

Name	Description
Data File 1: CSV (2 KB)	Correlation values between the surface roughness, thickness & volume fraction of oxide/Ti EMA layer and Drude & Lorentz coefficients for the sample T1~100 nm.
Data File 2: CSV (2 KB)	Correlation values between the surface roughness, thickness & volume fraction of oxide/Ti EMA layer and Drude & Lorentz coefficients for the sample T2~250 nm.
Data File 3: CSV (2 KB)	Correlation values between the surface roughness, thickness & volume fraction of oxide/Ti EMA layer and Drude & Lorentz coefficients for the sample T3~500 nm.
Data File 4: CSV (2 KB)	Correlation values between the surface roughness, thickness & volume fraction of oxide/Ti EMA layer and Drude & Lorentz coefficients for the sample T4~900 nm.

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Sputtering Parameters
Target	Ti
Substrates	Glass
Base pressure	$3 \times 10^{- 6}$
Working pressure	5 m Torr
Deposition rate	$\sim 47 nm / \min$
Deposition power	100 W
Substrate temperature	RT
Target–substrate distance	5 cm
Gas used	Ar (20 sccm)

Sample	$t$ (nm)	$D$ (nm)	$ε$ (%)	$δ_{rms}$ (nm)
Sample	XRD	SEM	$ε$ (%)	AFM	SE
$T_{1} \sim 100$	14.8	9–17	0.77	2.45	1.35
$T_{2} \sim 250$	25.3	19–28	0.40	3.69	2.78
$T_{3} \sim 500$	33.7	30–76	0.31	5.88	3.49
$T_{4} \sim 900$	38.6	34–98	0.28	11.84	9.32

Sample	Layer Thickness (nm)		Volume Fraction of Oxide/Ti EMA Layer (%)
Sample	Surface Roughness	Oxide/Ti EMA layer	${TiO}_{2}$	Ti
$T_{1} \sim 100$	1.35	1.08	23.66	76.34
$T_{2} \sim 250$	2.78	1.46	25.09	74.91
$T_{3} \sim 500$	3.49	1.78	26.98	73.02
$T_{4} \sim 900$	9.32	2.01	29.82	70.18

Different Sample Forms (Either Bulk or Films)	$λ$ (nm)	$n$	$k$
Evaporated Ti film [27]	589.2	2.33	3.18
Bulk (0001) Ti, air mechanically polished [19]	540.0	1.78	1.38
Bulk (0001) Ti, air chemically polished [19]	540.0	2.03	1.52
Bulk Ti, corrected for oxide layer [25]	632.8	2.68	3.55
Bulk Ti, corrected for oxide layer [28]	632.8	2.68	3.60
Bulk (001) Ti cleaned in UHV [46]	546.1	2.96	1.25
Bulk polycrystalline Ti cleaned in UHV [30]	546.1	3.09	1.11
Ti film [29]	632.8	3.10	4.03
Ti film prepared in UHV [19]	546.1	3.03	1.23
Polycrystalline Ti film [24]	548.6	2.54	3.43
Polycrystalline Ti films same day [21]	632.8	2.68–3.42	3.47–3.75
Polycrystalline Ti films after 72 hours [21]	632.8	2.54–3.13	3.00–3.49
Polycrystalline Ti films after 5 years [21]	632.8	2.37–3.17	2.92–3.47
Ti film prepared in vacuum, measurements in air corrected for oxides [22]	546.1	2.53	1.32
Polycrystalline Ti films (2.7 μm) at different processing condition [20]	540.0	1.82–2.06	1.19–1.49
Ti thin film of thickness 100–254 nm [23]	632.8	2.55–2.64	3.12–3.18

Sample	Calculated Optical Constants ( $n$ and $k$ ) of the Ti Films at Particular Wavelength ( $λ$ )
	$λ = 540 nm$		$λ = 628 nm$		$λ = 940 nm$		$λ = 1063 nm$
	$n$	$k$	$n$	$k$	$n$	$k$	$n$	$k$
$T_{1} \sim 100$	1.74	3.09	1.99	3.55	2.89	4.50	2.99	4.86
$T_{2} \sim 250$	1.72	3.06	1.97	3.52	2.86	4.46	2.96	4.82
$T_{3} \sim 500$	1.71	3.05	1.96	3.50	2.84	4.43	2.94	4.79
$T_{4} \sim 900$	1.70	3.03	1.95	3.49	2.83	4.41	2.93	4.77

Abstract

Supplementary Material (4)

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Tables (5)

Equations (3)

Applied Optics