Analysis of tolerances in polytopic-multiplexing holographic data storage

Tatsuro Ide

doi:10.1364/AO.55.002863

Applied Optics
Vol. 55,
Issue 11,
pp. 2863-2872
(2016)
•https://doi.org/10.1364/AO.55.002863

Analysis of tolerances in polytopic-multiplexing holographic data storage

Tatsuro Ide

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Tatsuro Ide, "Analysis of tolerances in polytopic-multiplexing holographic data storage," Appl. Opt. 55, 2863-2872 (2016)

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Abstract

A fast Fourier transformation (FFT)-based simulator was developed to analyze a recovered image of a hologram formed by polytopic multiplexing holographic data storage and to determine the positional tolerances of optical devices. By focusing the positional shift of $4 f$ configuration devices (phase mask, SLM, polytopic filter, and camera), the number of FFT iterations was reduced, and the calculation speed was improved. Using the simulator, the positional tolerances of these devices were determined. Also, to validate the simulator, simulated readout images under defocuses of the phase mask and camera were compared with experimentally obtained images and found to agree well.

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Item			Symbol	Value	Unit
Wavelength			$λ$	405	nm
Signal beam		NA	NA	0.6	–
Signal beam		Bragg angle	$ϕ_{B}$	−25 (center)	deg
Reference beam		Bragg angle	$θ_{B}$	$48 \pm 15$	deg
Focal length of OBJ			$f o$	12.4	mm
Focal length of RL			$f$	40	mm
Polytopic filter	Nyquist factor	Bragg	$k_{B}$	$\frac{\sqrt{1.3}}{2}$	–
	Nyquist factor	Pitch	$k_{P}$	$\sqrt{1.3}$	–
	Nyquist size		$a_{0}$	$\frac{f λ}{ρ_{SLM}}$	mm
	Aperture size	Bragg	$a_{PF, B}$	$k_{B} \cdot a_{0}$	mm
	Aperture size	Pitch	$a_{PF, P}$	$k_{P} \cdot a_{0}$	mm
SLM	Pixel number		$N_{SLM}$	1944	pixel
SLM	Pixel pitch		$p_{SLM}$	7.8	μm
Phase mask	Period (aver.)		$p_{PM}$	300	μm
Oversampling rate			$N_{OS}$	$\geq 2$	–
Mesh number			$N_{mesh}$	$2^{11 + n}$ , $n \geq 1$	pixel

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Applied Optics