Compact linearly polarized ceramic laser made with anisotropic nanostructured thin films

Alexandre Doucet; Gisia Beydaghyan; Pandurang V. Ashrit; Jean-François Bisson

doi:10.1364/AO.54.008326

Applied Optics
Vol. 54,
Issue 28,
pp. 8326-8331
(2015)
•https://doi.org/10.1364/AO.54.008326

Compact linearly polarized ceramic laser made with anisotropic nanostructured thin films

Alexandre Doucet, Gisia Beydaghyan, Pandurang V. Ashrit, and Jean-François Bisson

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Alexandre Doucet, Gisia Beydaghyan, Pandurang V. Ashrit, and Jean-François Bisson, "Compact linearly polarized ceramic laser made with anisotropic nanostructured thin films," Appl. Opt. 54, 8326-8331 (2015)

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Abstract

A novel method is proposed for the fabrication of polarizing laser mirrors for compact solid-state lasers using glancing angle deposition. Changing the inclination angle and the azimuthal orientation of the substrate during deposition allows one to create and control in-plane birefringence of a deposited thin film by changing its nanostructure. Principal refractive indices of tungsten trioxide films were determined for various deposition angles using transmission and reflection ellipsometry. High-reflectance contrast between orthogonal linear polarization directions was obtained using a single material without any additional processing steps. These birefringent films were the building blocks of a Bragg mirror that was tested as an output coupler of a ${({Yb}_{0.1} Y_{0.9})}_{3} {Al}_{5} O_{12}$ ceramic laser in a laser-diode end-pumped configuration. Continuous-wave, linearly polarized, transverse single-mode laser emission was obtained at a wavelength of 1030 nm with a polarization extinction ratio higher than 973 (30 dB).

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Direction with Respect to the Mirror			Inclination $θ$ (deg.)	Azimuth $φ$ (deg.)	Orientation with Respect to Vapor Flux ( $x y z$ ) (Fig. 1)	Estimated Index	Estimated Contrast ( $Δ n$ )
$x^{'}$	High reflectance axis	High-index layer	50	0–180	$x^{'}$ aligned with $x$	1.91	$Δ n_{x^{'}} = 0.22$
		Low-index layer	60	90–270	$x^{'}$ with $y$	1.69
$y^{'}$	Low reflectance axis	High-index layer	50	0–180	$y^{'}$ with $y$	1.87	$Δ n_{y^{'}} = 0.10$
		Low-index layer	60	90–270	$y^{'}$ with $x$	1.77

Polarizer Angle (deg.)	Reference Photodiode [Parasitic Signal] (mV)	Signal Photodiode [Parasitic Signal] (mV)	Signal Relative to the Reference Photodiode
88	3880 [6]	74 [9.4]	0.017
90	4080 [6]	56 [9.4]	0.011
92	4240 [6]	164 [9.4]	0.039
0	576 [ $< 1$ ]	6160 [ $< 1$ ]	10.7

Direction with Respect to the Mirror			Inclination $θ$ (deg.)	Azimuth $φ$ (deg.)	Orientation with Respect to Vapor Flux ( $x y z$ ) (Fig. 1)	Estimated Index	Estimated Contrast ( $Δ n$ )
$x^{'}$	High reflectance axis	High-index layer	50	0–180	$x^{'}$ aligned with $x$	1.91	$Δ n_{x^{'}} = 0.22$
		Low-index layer	60	90–270	$x^{'}$ with $y$	1.69
$y^{'}$	Low reflectance axis	High-index layer	50	0–180	$y^{'}$ with $y$	1.87	$Δ n_{y^{'}} = 0.10$
		Low-index layer	60	90–270	$y^{'}$ with $x$	1.77

Polarizer Angle (deg.)	Reference Photodiode [Parasitic Signal] (mV)	Signal Photodiode [Parasitic Signal] (mV)	Signal Relative to the Reference Photodiode
88	3880 [6]	74 [9.4]	0.017
90	4080 [6]	56 [9.4]	0.011
92	4240 [6]	164 [9.4]	0.039
0	576 [ $< 1$ ]	6160 [ $< 1$ ]	10.7

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Applied Optics