Abstract
A special sampling structure based on double exposure technology is proposed to achieve dual- wavelength lasing in the distributed feedback fiber laser. This structure is composed of two grating pitches in one sampling period, which could be realized by changing the fiber’s length in the fabrication. Through employing an equivalent phase shift, only a submicrometer-level precision is required for precise phase control. Then a stable dual-wavelength laser with the spacing of is obtained in the experiment successfully. The output power is and the sidemode suppression ratio is under a pumped power of .
© 2011 Optical Society of America
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