Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Ionic Polishing of Optical Surfaces

Not Accessible

Your library or personal account may give you access

Abstract

The controlled removal of material from the surface of insulators has been observed by using a positive ion beam. In the energy range 0.5–2.0 MeV the sputtering yield was observed to be unity. The application of this technique to the manufacture of high quality optical surfaces is discussed.

© 1966 Optical Society of America

Full Article  |  PDF Article
More Like This
Technical Feasibility of Figuring Optical Surfaces by Ion Polishing

J. B. Schroeder, H. D. Dieselman, and J. W. Douglass
Appl. Opt. 10(2) 295-299 (1971)

Air Gauge Measurement and Driven Lap Polishing in the Production of Aspheric Surfaces

George Random and Edward P. Wallerstein
Appl. Opt. 5(5) 737-740 (1966)

Fluid jet polishing of optical surfaces

Oliver W. Fähnle, Hedser van Brug, and Hans J. Frankena
Appl. Opt. 37(28) 6771-6773 (1998)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (4)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Tables (1)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved