Demonstration of high-energy 2<i>ω</i> (526.5 nm) operation on the National Ignition Facility Laser System

G. M. Heestand; C. A. Haynam; P. J. Wegner; M. W. Bowers; S. N. Dixit; G. V. Erbert; M. A. Henesian; M. R. Hermann; K. S. Jancaitis; K. Knittel; T. Kohut; J. D. Lindl; K. R. Manes; C. D. Marshall; N. C. Mehta; J. Menapace; E. Moses; J. R. Murray; M. C. Nostrand; C. D. Orth; R. Patterson; R. A. Sacks; R. Saunders; M. J. Shaw; M. Spaeth; S. B. Sutton; W. H. Williams; C. C. Widmayer; R. K. White; P. K. Whitman; S. T. Yang; B. M. Van Wonterghem

doi:10.1364/AO.47.003494

Applied Optics
Vol. 47,
Issue 19,
pp. 3494-3499
(2008)
•https://doi.org/10.1364/AO.47.003494

Demonstration of high-energy $2 ω$ ( $526.5 nm$ ) operation on the National Ignition Facility Laser System

G. M. Heestand, C. A. Haynam, P. J. Wegner, M. W. Bowers, S. N. Dixit, G. V. Erbert, M. A. Henesian, M. R. Hermann, K. S. Jancaitis, K. Knittel, T. Kohut, J. D. Lindl, K. R. Manes, C. D. Marshall, N. C. Mehta, J. Menapace, E. Moses, J. R. Murray, M. C. Nostrand, C. D. Orth, R. Patterson, R. A. Sacks, R. Saunders, M. J. Shaw, M. Spaeth, S. B. Sutton, W. H. Williams, C. C. Widmayer, R. K. White, P. K. Whitman, et al.

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G. M. Heestand, C. A. Haynam, P. J. Wegner, M. W. Bowers, S. N. Dixit, G. V. Erbert, M. A. Henesian, M. R. Hermann, K. S. Jancaitis, K. Knittel, T. Kohut, J. D. Lindl, K. R. Manes, C. D. Marshall, N. C. Mehta, J. Menapace, E. Moses, J. R. Murray, M. C. Nostrand, C. D. Orth, R. Patterson, R. A. Sacks, R. Saunders, M. J. Shaw, M. Spaeth, S. B. Sutton, W. H. Williams, C. C. Widmayer, R. K. White, P. K. Whitman, S. T. Yang, and B. M. Van Wonterghem, "Demonstration of high-energy 2ω (526.5 nm) operation on the National Ignition Facility Laser System," Appl. Opt. 47, 3494-3499 (2008)

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Abstract

A single beamline of the National Ignition Facility (NIF) has been operated at a wavelength of $526.5 nm$ ( $2 ω$ ) by frequency converting the fundamental $1053 nm$ ( $1 ω$ ) wavelength with an $18.2 mm$ thick type-I potassium dihydrogen phosphate (KDP) second-harmonic generator (SHG) crystal. Second-harmonic energies of up to $17.9 kJ$ were measured at the final optics focal plane with a conversion efficiency of 82%. For a similarly configured 192-beam NIF, this scales to a total $2 ω$ energy of $3.4 MJ$ full NIF equivalent (FNE).

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Optic	Material	Thickness (mm)	Anti-Reflection (AR) Coating
$1 ω$ continuous phase plate	synthetic fused silica	10	ammonia-hardened sol-gel $1 ω$ AR $\leq 0.05 %$ reflectance per surface average
target chamber vacuum window	synthetic fused silica	44	ammonia-hardened sol-gel $1 ω$ AR $\leq 0.04 %$ reflectance per surface maximum
second- harmonic generator	potassium dihydrogen phosphate	18.2	HMDS (hexamethyl disilizane) sol-gel $1 w$ AR input: 0.01% $1 ω$ reflectance $2 ω$ AR output: 0.01% $2 ω$ , $\leq 2.5 %$ $1 ω$ reflectance
Wedged focus lens	Synthetic fused silica	38 at center	Ammonia-hardened sol-gel $2 ω$ AR 0.05% $2 ω$ reflectance per surface $\leq 2.5 %$ $1 ω$ reflectance per surface
Main debris shield	Synthetic fused silica	10	Ammonia-hardened sol-gel $2 ω$ AR 0.07% $2 ω$ reflectance per surface

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Applied Optics