Abstract
Effects of thermal annealing at 400 °C on the optical, structural, and chemical properties of single-layer, single-layer, and narrow-bandpass filters deposited by conventional electron-beam evaporation (CE) and plasma ion-assisted deposition (PIAD) were investigated. In the case of films, the results show that the annealing of both CE and PIAD films increases the refractive index slightly and the extinction coefficient and surface roughness greatly. Annealing decreases the thickness of CE films drastically, whereas it does not vary that of PIAD films. For PIAD films, annealing increases the refractive index and decreases the extinction coefficient drastically. An x-ray photoelectron spectroscopy analysis suggests that an increase in the refractive index and a decrease in the extinction coefficient for PIAD films after annealing may be related to the enhanced concentration of in the annealed PIAD films and the changes in the chemical bonding states of , , and . It is found that multilayer filters, consisting of PIAD and CE films, are as deposited without microcracks and are also thermally stable after annealing.
© 2006 Optical Society of America
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