Abstract
The new and fast scatterometry method called optical diffraction microscopy is compared with atomic-force microscopy by use of cross-section scanning-electron microscope images as references. The sample is a high-aspect-ratio grating with a period of . To allow the atomic-force microscope to track all parts of the grating profile, the grating is investigated at different tilt angles. The measured quantities of the profile include sidewall angle , groove height , and degree of filling . The two methods, which respond to quite different material properties, give consistent results within standard uncertainties of , , and .
© 2006 Optical Society of America
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