Fabrication and testing of chemically micromachined silicon echelle gratings

Abstract

We have fabricated large, coarsely ruled, echelle patterns on silicon wafers by using photolithography and chemical-etching techniques. The grating patterns consist of 142-µm-wide, V-shaped grooves with an opening angle of 70.6°, blazed at 54.7°. We present a detailed description of our grating-fabrication techniques and the results of extensive testing. We have measured peak diffraction efficiencies of 70% at λ = 632.8 nm and conclude that the gratings produced by our method are of sufficient quality for use in high-resolution spectrographs in the visible and near IR (λ ≃ 500–5000 nm).

© 2000 Optical Society of America

Production and evaluation of silicon immersion gratings for infrared astronomy

J. P. Marsh, D. J. Mar, and D. T. Jaffe
Appl. Opt. 46(17) 3400-3416 (2007)

Echelle gratings: their testing and improvement

George R. Harrison, Erwin G. Loewen, and Robert S. Wiley
Appl. Opt. 15(4) 971-976 (1976)

Fabrication and evaluation of an etched infrared diffraction grating

U. U. Graf, D. T. Jaffe, E. J. Kim, J. H. Lacy, H. Ling, J. T. Moore, and G. Rebeiz
Appl. Opt. 33(1) 96-102 (1994)

Machined immersion grating with theoretically predicted diffraction efficiency

Yuji Ikeda, Naoto Kobayashi, Yuki Sarugaku, Takashi Sukegawa, Shigeru Sugiyama, Sayumi Kaji, Kenshi Nakanishi, Sohei Kondo, Chikako Yasui, Hirokazu Kataza, Takao Nakagawa, and Hideyo Kawakita
Appl. Opt. 54(16) 5193-5202 (2015)

Multifacet echelle grating for intensity broadening on spectral plane fabricated by rotating ion-beam etching

Jun Shi, Bin Sheng, Yuan-Shen Huang, Li-Na Peng, Liang-Yu Wang, Zheng-Ji Ni, Da-Wei Zhang, Ying-Fei Zhao, and Miao He
Appl. Opt. 58(18) 5040-5044 (2019)