Abstract
Scattering characteristics of multilayer fluoride coatings for 193
nm deposited by ion beam sputtering and the related interfacial
roughnesses are investigated. Quarter- and half-wave stacks of
MgF2 and LaF3 with increasing thickness are
deposited onto CaF2 and fused silica and are systematically
characterized. Roughness measurements carried out by atomic force
microscopy reveal the evolution of the power spectral densities of the
interfaces with coating thickness. Backward-scattering measurements
are presented, and the results are compared with theoretical
predictions that use different models for the statistical correlation
of interfacial roughnesses.
© 2000 Optical Society of America
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