Abstract

TiO₂–SiO₂ multilayer dielectric stacks that were deposited by ion-beam sputtering were found to have a granular structure. The grains were in the TiO₂ layers rather than in the SiO₂ layers. Their formation was due to the heating of the film during deposition. When the apparatus was modified to reduce the substrate temperature, the granularity was eliminated.

© 1996 Optical Society of America

Low-loss dielectric mirror with ion-beam-sputtered TiO₂–SiO₂ mixed films

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Optical properties of sol-gel spin-coated TiO₂ films and comparison of the properties with ion-beam-sputtered films

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Ion-assisted deposition of TiO₂/SiO₂ multilayers for mass production

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