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Wafer fault measurement by coherent optical processor

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Abstract

A microscope coherent optical processor based on the VanderLugt optical correlator is applied to the measurement of registration error in multilayer integrated-circuit wafers. A treatment of the effects of wafer faults on the correlation signal is given. Threshold criteria and fault-induced peak splitting of the correlation signal from reject production samples are exploited to demonstrate the easy and rapid detection of faults in partially processed integrated-circuit wafers.

© 1994 Optical Society of America

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