Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Extreme-ultraviolet Mo/Si multilayer mirrors deposited by radio-frequency-magnetron sputtering

Not Accessible

Your library or personal account may give you access

Abstract

Mo/Si multilayer mirrors with a high reflectance at normal incidence in the 130–135-Å spectral region have been deposited by rf magnetron sputtering. A new and quick technique was used to calibrate the deposition rates. Characterization by transmission electron microscopy (TEM) and grazing-incidence x-ray diffraction (XRD) indicated good thickness control of the deposition process and low interface roughness. However, the TEM and, indirectly, the XRD reflectance measurements, indicated that the interfaces are asymmetric. A brief review discussing the origin of the modulation of the Bragg peak intensities in the XRD reflectance is given. An analytical formula was derived for periodic multilayers that describes the effect of asymmetric interfaces on the amplitude of the Bragg peak modulation. Theoretically, in XRD reflectance measurements, any asymmetry in the interdiffusion of the Mo–Si interfaces results in a decrease of the usual amplitude modulation of the Bragg peaks. Extreme-ultraviolet (XUV) reflectance measurements were also made with synchrotron radiation on a new high-resolution reflectometer. The near-normal-incidence peak reflectances measured at λ ≈ 134 A were ~59% for the best multilayer mirrors. Good fits to both XRD and XUV reflectance measurements have been obtained with a model that allows for interface asymmetry.

© 1994 Optical Society of America

Full Article  |  PDF Article
More Like This
Low-stress and high-reflectance Mo/Si multilayers for extreme ultraviolet lithography by magnetron sputtering deposition with bias assistance

Bo Yu, Chunshui Jin, Shun Yao, Chun Li, Yu Liu, Feng Zhou, Benyin Guo, Hui Wang, Yao Xie, and Liping Wang
Appl. Opt. 56(26) 7462-7468 (2017)

Survey of Ti-, B-, and Y-based soft x-ray–extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region

Claude Montcalm, Patrick A. Kearney, J. M. Slaughter, Brian T. Sullivan, M. Chaker, Henri Pépin, and Charles M. Falco
Appl. Opt. 35(25) 5134-5147 (1996)

Extreme-ultraviolet-induced oxidation of Mo/Si multilayers

Nicolas Benoit, Sven Schröder, Sergiy Yulin, Torsten Feigl, Angela Duparré, Norbert Kaiser, and Andreas Tünnermann
Appl. Opt. 47(19) 3455-3462 (2008)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (11)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Tables (3)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (9)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved