Damage thresholds of (ZrO2–Y2O3)/SiO2 reflectors used for XeCl lasers

Peifu Gu; Xu Liu; Jinfa Tang

doi:10.1364/AO.32.001528

Applied Optics
Vol. 32,
Issue 9,
pp. 1528-1530
(1993)
•https://doi.org/10.1364/AO.32.001528

Damage thresholds of (ZrO₂–Y₂O₃)/SiO₂ reflectors used for XeCl lasers

Peifu Gu, Xu Liu, and Jinfa Tang

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Peifu Gu, Xu Liu, and Jinfa Tang, "Damage thresholds of (ZrO₂–Y₂O₃)/SiO₂ reflectors used for XeCl lasers," Appl. Opt. 32, 1528-1530 (1993)

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Abstract

An excimer laser reflector at the wavelength of 308 nm (XeCl) consisting of materials of ZrO₂–Y₂O₃ and SiO₂ is prepared. The reflectance reaches ~99.5% and the laser-induced damage threshold is raised to ~8.5 J/cm². The ZrO₂–Y₂O₃ mixture is proven to be a film material with a high laser damage resistance.

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Material	Refractive Index	Extinction Coefficient	Stress (kg/cm²)^a	Laser Damage Threshold (J/cm²)
ZrO₂	1.94	1.3 × 10⁻³	1100	1–5
Y₂O₃	1.83	2.5 × 10⁻³	—	3–5
HfO₂	1.93	9.4 × 10⁻⁴	1350	6–8
ZrO₂–Y₂O₃ (87:13)	1.93	8.8 × 10⁻⁴	740	12–20
SiO₂	1.52	—	−690	20–28

Factor	A Substrate Temperature (°C)	B Oxygen Pressure (Torr)	C Deposition Rate (nm/s)	D ZrO₂:Y₂O₃
Level 1	25	1 × 10⁻⁴	0.5	79:21
Level 2	150	2 × 10⁻⁴	1	87:13
Level 3	200	3 × 10⁻⁴	2	92:8

Run No.	A (°C)	B (Torr)	C (nm/s)	D (ZrO₂:Y₂O₃)
1	25	1 × 10⁻⁴	0.5	79:21
2	25	2 × 10⁻⁴	1	87:13
3	25	3 × 10⁻⁴	2	92:8
4	150	1 × 10⁻⁴	1	92:8
5	150	2 × 10⁻⁴	2	79:21
6	150	3 × 10⁻⁴	0.5	87:13
7	200	1 × 10⁻⁴	2	87:13
8	200	2 × 10⁻⁴	0.5	92:8
9	200	3 × 10⁻⁴	1	79:21

Run No.	Refractive Index	Extinction Coefficient (× 10⁻⁴)	Laser Damage Threshold (J/cm²)
1	1.87	6.2	8.8
2	1.89	6.9	7.3
3	1.90	11.2	7.8
4	1.93	4.8	19.2
5	1.88	5.8	17.4
6	1.87	8.8	17.7
7	1.91	8.9	16.4
8	1.95	9.1	16.1
9	1.90	5.7	14.8

Level Σ	Refractive Index				Extinction Coefficient (× 10⁻⁴)				Laser Damage Threshold (J/cm²)
Level Σ	A	B	C	D	A	B	C	D	A	B	C	D
I	5.66	5.71	5.69	5.65	24.3	19.9	24.1	17.7	23.9	44.5	42.6	41.1
II	5.68	5.72	5.72	5.67	19.4	21.6	17.4	24.6	54.3	40.8	41.3	41.3
III	5.76	5.67	5.69	5.78	23.7	25.7	25.9	25.1	47.3	40.3	41.6	43.2
Range	0.1	0.05	0.03	0.13	4.9	5.8	8.5	7.4	30.4	4.2	1.3	2.1

Reflector^a	Material	Reflectance at Normal Incidence (%)		Threshold (J/cm²)
Reflector^a	Material	At 380 nm	At 325 nm	Threshold (J/cm²)
A/2L(HL)¹⁴	79% ZrO₂–21% Y₂O₃ and SiO₂	99.18	99.57	7.5–8.5
H/G	ZrO₂ and SiO₂	99.34	99.51	2.7
	HfO₂ and SiO₂	99.08	99.48	2.2
A/(HL)¹⁵	79% ZrO₂–21% Y₂O₃ and SiO₂	99.45	99.69	6.3–8.3
H/G	ZrO₂ and SiO₂	99.44	99.61	2.8
	HfO₂ and SiO₂	99.20	99.24	1.9
A/0.33 H 1.73 L	79% ZrO₂–21% Y₂O₃ and SiO₂	99.46	99.75	7.5–8.5
0.65 H 1.42 L
(HL)¹⁴H/G

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Applied Optics