Abstract

The choice of the operational wavelength for a soft-x-ray projection lithography system affects a wide variety of system parameters such as optical design, sources, resists, and multilayer mirrors. Several system constraints limit the choice for the operational wavelength. In particular, optical imaging requirements place an upper limit and throughput issues place a lower limit on the wavelength selection. We have determined that there are several discrete wavelength regions between 10 and 25 nm that satisfy the system-imposed constraints of high resolution, large depth of focus, and high throughput.

© 1993 Optical Society of America

Multilayer mirror technology for soft-x-ray projection lithography

D. G. Stearns, R. S. Rosen, and S. P. Vernon
Appl. Opt. 32(34) 6952-6960 (1993)

Characterization of AZ PN114 resist for soft-x-ray projection lithography

K. Early, D. M. Tennant, D. Y. Jeon, P. P. Mulgrew, A. A. MacDowell, O. R. Wood, G. D. Kubiak, and D. A. Tichenor
Appl. Opt. 32(34) 7044-7049 (1993)

Front-end design issues in soft-x-ray projection lithography

Natale M. Ceglio, Andrew M. Hawryluk, and Gary E. Sommargren
Appl. Opt. 32(34) 7050-7056 (1993)

Radiation hardness of molybdenum silicon multilayers designed for use in a soft-x-ray projection lithography system

David P. Gaines, Ronnie C. Spitzer, Natale M. Ceglio, Michael Krumrey, and Gerhard Ulm
Appl. Opt. 32(34) 6991-6998 (1993)

Condenser optics, partial coherence, and imaging for soft-x-ray projection lithography

Gary E. Sommargren and Lynn G. Seppala
Appl. Opt. 32(34) 6938-6944 (1993)