K. Balasubramanian, X. F. Han, and K. H. Guenther, "Comparative study of titanium dioxide thin films produced by electron-beam evaporation and by reactive low-voltage ion plating," Appl. Opt. 32, 5594-5600 (1993)
Titanium dioxide (TiO2) is often used as a high refractive-index material for multilayer optical coatings. However, the optical properties of TiO2 films depend strongly on the deposition process and its parameters. A comparative study of TiO2 films fabricated by conventional electron-beam evaporation and by reactive low-voltage ion plating that uses different phases of Ti–O as starting materials is reported. Results on the variability of TiO2 thin films are analyzed in relation to process parameters. The potential of fabricating high and low refractive-index multilayer stacks with TiO2 only, by employing two different deposition processes, is presented with a practical example.
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The base vacuum for runs = 3 × 10−6 mbar; LN2 was used for the cryotrap.
The maximum temperature reported is the temperature at the end of the coating process.
All thicknesses reported are calculated values from spectrophotometric data.
Tables (4)
Table 1
Typical RLVIP Process Parameters for Deposition of Oxide Thin Films
Film Material
Starting Material
Base Pressure (10−6 mbar)
Partial Pressures of Process Gases (10−5 mbar)
E-Gun Power (kW)
Plasma Arc Current (Amps)
Rate (nm/s)
Thickness (nm)
Typical Refractive Index at 550 nm
Ar
O2
TiO2
TiO
3.0
6.8
5.3
2.5
50 ∼ 55
0.28
53
2.48
Ta2O5
Ta2O5
5.5
6.5
6.4
3.0
50 ∼ 53
0.27
60
2.25
HfO2
Hf
4.0
6.7
6.9
4.3
50 ∼ 53
0.17
251
2.15
ZrO2
Zr
4.0
6.7
6.1
4.2
50 ∼ 53
0.30
60
2.28
SiO2
Si
5.5
6.5
4.5
4.6
52 ∼ 58
0.25
89
1.48
Al2O3
Al
5.6
6.4
6.2
5.2
50 ∼ 52
0.30
276
1.65
Y2O3
Y2O3
2.0
3.9
8.0
<2.0
55 ∼ 60
0.29
483
1.98
Table 2
Process Parameters and Results of TiO2 Films Deposited by Conventional EB Evaporation with Ti3O5 (OS50) as the Starting Source Materiala
The base vacuum for runs = 3 × 10−6 mbar; LN2 was used for the cryotrap.
The maximum temperature reported is the temperature at the end of the coating process.
All thicknesses reported are calculated values from spectrophotometric data.
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