Abstract
It is shown how light scattering provides a powerful tool for thin-film
characterization. The introduction of a roughness isotropy degree permits the
extraction of structural parameters of the stacks. Replication functions and
residual roughnesses are given for TiO2, SiO2, and
Ta2O5 materials produced by ion-assisted deposition
and ion plating. Additional confirmation is given by measurements of scattering
versus wavelength. The sensitivity of design to material and substrate effects
is studied. At low-loss levels, surface and bulk phenomena are discussed
together. Microstructure is characterized in the frequency bandwidth given by
experiment.
© 1993 Optical Society of America
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