Abstract

A spectroscopic total-integrated-scatter instrument has been constructed. It uses a Coblentz sphere for the collection of the scattered light and a lamp with a monochromator as a light source. It can be used to measure diffuse reflectance as well as transmittance. The instrument has been used to measure diffuse reflectance of thermally and chemical-vapor-deposition oxidized silicon wafers. Comparisons are made with measurements by using a spectrophotometer with an integrating sphere. The data have been interpreted with a parameterized model for light scattering from a double layer, to obtain rms surface roughness values for the two interfaces of the oxide film.

© 1993 Optical Society of America

Determination of the SiO₂/Si interface roughness by diffuse reflectance measurements

A. Roos, M. Bergkvist, and C. G. Ribbing
Appl. Opt. 27(22) 4660-4663 (1988)

Determination of the SiO₂/Si interface roughness by diffuse reflectance measurements

A. Roos, M. Bergkvist, and C. G. Ribbing
Appl. Opt. 27(20) 4314-4317 (1988)

Relationship of the total integrated scattering from multilayer-coated optics to angle of incidence, polarization, correlation length, and roughness cross-correlation properties

J. M. Elson, J. P. Rahn, and J. M. Bennett
Appl. Opt. 22(20) 3207-3219 (1983)

Optical scattering from oxidized metals. 2: Model verification for oxidized copper

Mikael Bergkvist, Arne Roos, Carl G. Ribbing, Jean M. Bennett, and Lars Mattsson
Appl. Opt. 28(18) 3902-3907 (1989)

Focusing properties of hemispherical mirrors for total integrating scattering instruments

J. Lorincik and J. Fine
Appl. Opt. 36(31) 8270-8274 (1997)