Abstract

Substrate temperature is one of the most important processing parameters for optical coating deposition. The distribution of substrate temperature during deposition has been measured and calculated. Two kinds of heating method have been compared. The experiments show that the use of halogen lamps in a front surface heating system can achieve better uniformity of temperature distribution and diminish the influence of the evaporating source. The experiments provide some very useful production processing parameters.

© 1989 Optical Society of America

Transparent conductive indium oxide film deposited on low temperature substrates by activated reactive evaporation

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