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Direct formation of grating structures on silicon using KrF laser radiation

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Abstract

Surface grating structures with a periodicity of 1.46 μm and depth of modulation of 20 nm have been produced on single crystal silicon by irradiation with two coherent interfering beams of 248-nm laser light at energy densities of 1.4–1.8 J cm−2. The resulting structures are consistent with the expected melting and resolidification of the surface layer of the sample.

© 1989 Optical Society of America

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