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Thickness measurement using Young’s interferometric experiment

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Abstract

The paper describes an interferometer for use in the thickness determination of optical thin films. The standard deviation obtained by repeated measurements is of the order of 0.3 nm. In those measurements, the thickness is obtained as a fraction of the applied wavelength, which consequently acts as the unit of length. The method does not require a layer of known thickness for calibration.

© 1988 Optical Society of America

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