Abstract

A quarterwave-thick narrow-bandwidth antireflective coating for fused silica optical components and KDP crystals has been developed. The coating consists of porous silica prepared from a silica sol in ethanol. It is applied by dip or spin from a solution at room temperature and requires no further treatment. The laser damage threshold levels are about equal to the surface damage thresholds of the uncoated substrates.

© 1986 Optical Society of America

Method for the preparation of porous silica antireflection coatings varying in refractive index from 1.22 to 1.44

Ian M. Thomas
Appl. Opt. 31(28) 6145-6149 (1992)

Porous fluoride antireflective coatings

Ian M. Thomas
Appl. Opt. 27(16) 3356-3358 (1988)

Wide spectrum antireflective coating for fused silica and other glasses

Bulent E. Yoldas and Deborah P. Partlow
Appl. Opt. 23(9) 1418-1424 (1984)

Single-layer TiO₂ and multilayer TiO₂–SiO₂ optical coatings prepared from colloidal suspensions

Ian M. Thomas
Appl. Opt. 26(21) 4688-4691 (1987)

Single layer Al₂O₃·H₂O and multilayer Al₂O₃·H₂O–SiO₂ optical coatings prepared from colloidal suspensions

Ian M. Thomas
Appl. Opt. 28(18) 4013-4016 (1989)