Abstract

Laser-assisted evaporation of materials has several unique features and is being used increasingly as a thin-film deposition process. Characteristics of this technique and design parameters of a laser-assisted evaporation system are discussed. Types of source material, scanning and focusing of the laser beam, optical elements to deliver laser power to the sources, and emplacement of these elements to deposit thick films are explained.

© 1985 Optical Society of America

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