Abstract

Thin metal films, grown under ion bombardment, usually exhibit optical properties different from bulk. We interpret the observed optical density of thin copper films grown under different conditions of argon-ion bombardment by modifying the bulk dielectric function to take account of changes in the lattice parameter, grain size, and specific density.

© 1985 Optical Society of America

Ion assisted deposition of thermally evaporated Ag and Al films

Chang Kwon Hwangbo, Linda J. Lingg, John P. Lehan, H. Angus Macleod, John L. Makous, and Sang Yeol Kim
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Properties of CeO₂ thin films prepared by oxygen-ion-assisted deposition

Roger P. Netterfield, W. G. Sainty, P. J. Martin, and S. H. Sie
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Ion bombardment-induced retarded moisture adsorption in optical thin films

Steven G. Saxe, M. J. Messerly, Bertrand Bovard, Lewis DeSandre, Fred J. Van Milligen, and H. A. Macleod
Appl. Opt. 23(20) 3633-3637 (1984)

Ion-assisted deposition of optical thin films: low energy vs high energy bombardment

John R. McNeil, Alan C. Barron, S. R. Wilson, and W. C. Herrmann
Appl. Opt. 23(4) 552-559 (1984)

Relation between optical scattering, microstructure and topography of thin silver films. 1: Optical scattering and topography

Jean M. Bennett, Hugh H. Hurt, John P. Rahn, J. Merle Elson, Karl H. Guenther, Monique Rasigni, and Francoise Varnier
Appl. Opt. 24(16) 2701-2711 (1985)