Abstract

The refractive-index change effect due to electron beam irradiation has been successfully applied to write directly optical gratings as large as 0.5 × 0.65 mm2, with periods of 0.5–2 μm, in amorphous chalcogenide (for example, As2S3, As40Se10S40Ge10) films, using a common scanning electron microscope. Fabrication techniques and optical characteristics are discussed.

© 1978 Optical Society of America

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